説明
Target Substrate 4H-SiC Hot Wall CVD Wafer Size 100 mm (4") / 150 mm (6") — Growth Rate > 50 μm / hour High-speed growth Continuous Growth Thickness Up to 150 μm Continuous deposition capable Throughput 4 wafers / hour Based on 10 μm SiC epi Wafer In-plane Temp. Uniformity (4") < 1 °C — Wafer In-plane Temp. Uniformity (6") < 2 °C — Thickness Uniformity < 2 % (σ/mean) E.E = 3 mm Doping Concentration Uniformity < 4 % (σ/mean) E.E = 6 mm Defect Density < 0.02 / cm2 Low-defect Reactor Type Hot-wall CVD Single-wafer Heating Method Resistive Heating Side + bottom Gas Inlet Upper Gas Inlet Nozzle position adjustable Wafer Rotation High-speed Rotation Ensures uniformity Wafer Transfer Cassette-to-Cassette Auto Transfer Robotic auto transfer High-Temp Handling High-temperature wafer handling supported Improves productivity Source Gas SiHCl3 (TCS), SiH2Cl2 (DCS) Silicon source Carrier Gas H2 Hydrogen Etching Gas HCl — Doping Gas N2 (n-type) / TMA (p-type) Common usage構成
SIC EpitaxialOEMモデルの説明
single-wafer SiC Epitaxial Reactorドキュメント
ドキュメントなし
カテゴリ
Epitaxial deposition (EPI)
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
150879
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
NUFLARE
EPIREVO S6
カテゴリ
Epitaxial deposition (EPI)
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
150879
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Target Substrate 4H-SiC Hot Wall CVD Wafer Size 100 mm (4") / 150 mm (6") — Growth Rate > 50 μm / hour High-speed growth Continuous Growth Thickness Up to 150 μm Continuous deposition capable Throughput 4 wafers / hour Based on 10 μm SiC epi Wafer In-plane Temp. Uniformity (4") < 1 °C — Wafer In-plane Temp. Uniformity (6") < 2 °C — Thickness Uniformity < 2 % (σ/mean) E.E = 3 mm Doping Concentration Uniformity < 4 % (σ/mean) E.E = 6 mm Defect Density < 0.02 / cm2 Low-defect Reactor Type Hot-wall CVD Single-wafer Heating Method Resistive Heating Side + bottom Gas Inlet Upper Gas Inlet Nozzle position adjustable Wafer Rotation High-speed Rotation Ensures uniformity Wafer Transfer Cassette-to-Cassette Auto Transfer Robotic auto transfer High-Temp Handling High-temperature wafer handling supported Improves productivity Source Gas SiHCl3 (TCS), SiH2Cl2 (DCS) Silicon source Carrier Gas H2 Hydrogen Etching Gas HCl — Doping Gas N2 (n-type) / TMA (p-type) Common usage構成
SIC EpitaxialOEMモデルの説明
single-wafer SiC Epitaxial Reactorドキュメント
ドキュメントなし