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APPLIED MATERIALS (AMAT) P5000 ETCH
    説明
    Including - clamp Mark II chamber *2 - endpoint and minicontroller
    構成
    構成なし
    OEMモデルの説明
    The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.
    ドキュメント

    ドキュメントなし

    カテゴリ
    Dry / Plasma Etch

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    75405


    ウェーハサイズ:

    6"/150mm


    ヴィンテージ:

    1995


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示

    APPLIED MATERIALS (AMAT)

    P5000 ETCH

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 60日以上前
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    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    75405


    ウェーハサイズ:

    6"/150mm


    ヴィンテージ:

    1995


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Including - clamp Mark II chamber *2 - endpoint and minicontroller
    構成
    構成なし
    OEMモデルの説明
    The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示