GAMMA 2100
カテゴリ
Etch/Asher概要（Overview）
The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.
現在の掲載品
3
サービス
検査、保証、鑑定、ロジスティクス
