説明
説明なし構成
Software Version: A2.1-Release CIM: SECGEM Process: LAM Metal Main System: Main System OK Handler System: LPI2200 (2) OK Factory Interface: NONE MAIN AC/SYSTEM CONTROLLER (1) OKOEMモデルの説明
The TCP 9600PTX is a high-density, low-pressure etch system from Lam Research’s TCP product line. It incorporates the company’s patented Transformer Coupled Plasma source technology for etching 0.25 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution for their advanced processing needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer configuration or in conjunction with the Alliance multi-chamber cluster platform.ドキュメント
ドキュメントなし
LAM RESEARCH CORPORATION
TCP 9600PTX
検証済み
カテゴリ
Etch/Asher
最終検証： 23日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
111958
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
TCP 9600PTX
カテゴリ
Etch/Asher
最終検証： 23日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
111958
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Software Version: A2.1-Release CIM: SECGEM Process: LAM Metal Main System: Main System OK Handler System: LPI2200 (2) OK Factory Interface: NONE MAIN AC/SYSTEM CONTROLLER (1) OKOEMモデルの説明
The TCP 9600PTX is a high-density, low-pressure etch system from Lam Research’s TCP product line. It incorporates the company’s patented Transformer Coupled Plasma source technology for etching 0.25 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution for their advanced processing needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer configuration or in conjunction with the Alliance multi-chamber cluster platform.ドキュメント
ドキュメントなし