Anelva: ILD-4100 three-chamber cluster tool. Helicon wave source licensed from Plasma and Materials Technology (MORI source), can be configured with Helicon, RIE, and microwave downstream asher chambers, metal etch, poly etch processes.

CANON acquired ANELVA and became CANON ANELVA Corporation which focuses on: Vacuum thin-film deposition and processing equipment, semiconductor device manufacturing equipment, storage device manufacturing equipment, equipment for electronic device manufacturing and for R&D, maintenance service, and vacuum components.


ILD-4100

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