説明
説明なし構成
RLSA Chamber information : ESC for wafer with Dual He Cooling Nihon Koshuha Microwave Generator / Model is MKS 050B04C-OSC-V Turbo Pump:SHIMADZU / Model is FT2301D Generator Details: Top MKS-050B04 PS-V Bottom Daihen RGA-20C Gas Box Configuration : 1 N2 2 TSA 3 Ar 4 H2 5 NF3 6 SiH4OEMモデルの説明
Tactras™ is a 300mm plasma etch system that enhances etch process productivity. It provides customized solutions for high aspect ratio holes, trench etch, mask and dielectric etch, and BEOL dielectric etch. The common base product design allows Tactras™ to be built for specific applications. The etch chambers that can be installed on Tactras™ employ optimal design technologies to achieve excellent within-wafer uniformity, low wafer-to-wafer variation, and high selectivity in shaping the etch profile. Up to 6 chambers can be installed on Tactras™, each capable of handling different etch applications as required. Tactras™ offers operational advantages enabled by TEL’s cumulative knowhow on production technology, including a robust design to minimize machine-to-machine and chamber-to-chamber variation, particle reduction technology, unit-assembly inspection, and labor-saving automation. All of these contribute to customers’ productivity.ドキュメント
ドキュメントなし
TEL / TOKYO ELECTRON
TACTRAS
検証済み
カテゴリ
Plasma Etch
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
40071
ウェーハサイズ:
12"/300mm
ヴィンテージ:
2012
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示TEL / TOKYO ELECTRON
TACTRAS
検証済み
カテゴリ
Plasma Etch
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
40071
ウェーハサイズ:
12"/300mm
ヴィンテージ:
2012
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
RLSA Chamber information : ESC for wafer with Dual He Cooling Nihon Koshuha Microwave Generator / Model is MKS 050B04C-OSC-V Turbo Pump:SHIMADZU / Model is FT2301D Generator Details: Top MKS-050B04 PS-V Bottom Daihen RGA-20C Gas Box Configuration : 1 N2 2 TSA 3 Ar 4 H2 5 NF3 6 SiH4OEMモデルの説明
Tactras™ is a 300mm plasma etch system that enhances etch process productivity. It provides customized solutions for high aspect ratio holes, trench etch, mask and dielectric etch, and BEOL dielectric etch. The common base product design allows Tactras™ to be built for specific applications. The etch chambers that can be installed on Tactras™ employ optimal design technologies to achieve excellent within-wafer uniformity, low wafer-to-wafer variation, and high selectivity in shaping the etch profile. Up to 6 chambers can be installed on Tactras™, each capable of handling different etch applications as required. Tactras™ offers operational advantages enabled by TEL’s cumulative knowhow on production technology, including a robust design to minimize machine-to-machine and chamber-to-chamber variation, particle reduction technology, unit-assembly inspection, and labor-saving automation. All of these contribute to customers’ productivity.ドキュメント
ドキュメントなし