説明
No missing構成
Gas: N2, O2, AR Process: HTOOEMモデルの説明
"VERTRON-III(J3). Model Numbers: DD-853V/DJ-853V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers. The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."ドキュメント
ドキュメントなし
KOKUSAI-ELECTRIC (KE)
DD 853V
検証済み
カテゴリ
Furnaces / Diffusion
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
113630
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
KOKUSAI-ELECTRIC (KE)
DD 853V
カテゴリ
Furnaces / Diffusion
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
113630
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
No missing構成
Gas: N2, O2, AR Process: HTOOEMモデルの説明
"VERTRON-III(J3). Model Numbers: DD-853V/DJ-853V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers. The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."ドキュメント
ドキュメントなし