The SRTF-302LP system is designed based on a resistively heated, single wafer furnace technology to address conventional batch furnace thermal applications as well as RTP applications up to 1100°C. The system provides excellent process repeatability and stability at a minimum cost of ownership.

TEL / TOKYO ELECTRON / WAFERMASTERS

SRTF-302LP

The SRTF-201LP system is designed based on a resistively heated, single wafer furnace technology to address conventional batch furnace thermal applications as well as RTP applications up tp 1150°C. The system provides excellent process repeatability and stability at a minimum cost of ownership.

TEL / TOKYO ELECTRON / WAFERMASTERS

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SRTF-201LP

SRTF-302LP

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すべてのTEL / TOKYO ELECTRON / WAFERMASTERS Furnaces / Diffusion