説明
説明なし構成
IBA_HiCurOEMモデルの説明
The Quantum X Plus is a groundbreaking single-wafer, high-current implanter that has set new standards in 65nm production. It offers superior low-energy, high-dose performance, enabling device scaling and delivering exceptional capabilities for Logic and Memory applications. The implanter's fixed beam technology, combined with a precision mechanical scanning system, provides unmatched features such as defect engineering for ultra-shallow junction formation below 45nm and precise angle control for advanced memory structures. When paired with the Applied Vantage RadiancePlus RTP, the Quantum X Plus forms a powerful combination, incorporating cutting-edge co-implantation and defect engineering technology to meet both current and future high-current implantation requirements. Key features of the Quantum X Plus include the highest productivity for ultra-shallow junction formation across a wide energy range, two-dimensional parallel scanning with StepScan for precise angle control and iso-centric scanning for high tilt applications, advanced motion control for optimal crystal defect management, and predictive and managed uniformity for consistent implant results.ドキュメント
ドキュメントなし
カテゴリ
High Current
最終検証： 9日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
144804
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
QUANTUM X PLUS
カテゴリ
High Current
最終検証： 9日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
144804
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
IBA_HiCurOEMモデルの説明
The Quantum X Plus is a groundbreaking single-wafer, high-current implanter that has set new standards in 65nm production. It offers superior low-energy, high-dose performance, enabling device scaling and delivering exceptional capabilities for Logic and Memory applications. The implanter's fixed beam technology, combined with a precision mechanical scanning system, provides unmatched features such as defect engineering for ultra-shallow junction formation below 45nm and precise angle control for advanced memory structures. When paired with the Applied Vantage RadiancePlus RTP, the Quantum X Plus forms a powerful combination, incorporating cutting-edge co-implantation and defect engineering technology to meet both current and future high-current implantation requirements. Key features of the Quantum X Plus include the highest productivity for ultra-shallow junction formation across a wide energy range, two-dimensional parallel scanning with StepScan for precise angle control and iso-centric scanning for high tilt applications, advanced motion control for optimal crystal defect management, and predictive and managed uniformity for consistent implant results.ドキュメント
ドキュメントなし