説明
High-Current Ion Implanter構成
Ancillary: Abatement Unit, Process Gases: Ar, AsH3, BF3, N2OEMモデルの説明
The xR LEAP is the industry’s first sub-keV ion implanter that utilizes patented differential lens technology to achieve beam currents as low as 200eV. This paves the way for ultra-shallow junction development required in advanced 0.18µm and 0.13µm devices. The enhancements built into the xRS Series implanters result in higher throughput, with 235 wafers per hour for 200mm and 220 wafers per hour for 300mm, and lower cost of ownership.ドキュメント
ドキュメントなし
カテゴリ
High Current
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
142524
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
xR LEAP
カテゴリ
High Current
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
142524
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
High-Current Ion Implanter構成
Ancillary: Abatement Unit, Process Gases: Ar, AsH3, BF3, N2OEMモデルの説明
The xR LEAP is the industry’s first sub-keV ion implanter that utilizes patented differential lens technology to achieve beam currents as low as 200eV. This paves the way for ultra-shallow junction development required in advanced 0.18µm and 0.13µm devices. The enhancements built into the xRS Series implanters result in higher throughput, with 235 wafers per hour for 200mm and 220 wafers per hour for 300mm, and lower cost of ownership.ドキュメント
ドキュメントなし