説明
説明なし構成
Electric source: 208V/3Ph/170A Gases: B/As/Ar Total energy: 200 KEV Throughput: 210 pieces/hour Features: -(25) Slots cassette -(4) cassettes capacity -ELS source head -(2) SUN Workstations -VME 177 cell controller -(2) SDS gas lines (ASH3 and PH3) -(2) HEWLETT-PACKARD Gas lines (BF3 and ARGON) -P-SHOWER Electron shower -Post acceleration high voltage, 80 KEV -Belt type rotary drive -Variable implant angle, 2-Axis -Real time patented dose controller -5E11~1E16 Ions/cm2 dose range -Arm Std Arm 200mm -Wafer Holder Std 200mm -Beam energy: 1 MeV -Beam Current: 1 mA -CE markedOEMモデルの説明
The Eaton/Axcelis GSD 200 is a high current implanter that can handle wafers up to 8 inches in size and has a maximum energy of 180KeV. It is part of the GSD platform, which is known for being the longest manufactured and supported batch ion implanter in the industry. Ion implantation, the technology used by this machine, involves bombarding ionized species into the first atomic layers of a solid to introduce different species into a substrate. This process can change the chemical or tribological properties of the surface, such as hardness, wear resistance, resistance to chemical attack, and reduced friction. It can also improve the oxidation resistance of coatings by forming a dense Al2O3 scale. This technology is widely used in micro-electronics, optics, bio-materials, and doped semiconductor materials.ドキュメント
ドキュメントなし
AXCELIS
GSD 200
検証済み
カテゴリ
High Current
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
78552
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AXCELIS
GSD 200
カテゴリ
High Current
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
78552
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Electric source: 208V/3Ph/170A Gases: B/As/Ar Total energy: 200 KEV Throughput: 210 pieces/hour Features: -(25) Slots cassette -(4) cassettes capacity -ELS source head -(2) SUN Workstations -VME 177 cell controller -(2) SDS gas lines (ASH3 and PH3) -(2) HEWLETT-PACKARD Gas lines (BF3 and ARGON) -P-SHOWER Electron shower -Post acceleration high voltage, 80 KEV -Belt type rotary drive -Variable implant angle, 2-Axis -Real time patented dose controller -5E11~1E16 Ions/cm2 dose range -Arm Std Arm 200mm -Wafer Holder Std 200mm -Beam energy: 1 MeV -Beam Current: 1 mA -CE markedOEMモデルの説明
The Eaton/Axcelis GSD 200 is a high current implanter that can handle wafers up to 8 inches in size and has a maximum energy of 180KeV. It is part of the GSD platform, which is known for being the longest manufactured and supported batch ion implanter in the industry. Ion implantation, the technology used by this machine, involves bombarding ionized species into the first atomic layers of a solid to introduce different species into a substrate. This process can change the chemical or tribological properties of the surface, such as hardness, wear resistance, resistance to chemical attack, and reduced friction. It can also improve the oxidation resistance of coatings by forming a dense Al2O3 scale. This technology is widely used in micro-electronics, optics, bio-materials, and doped semiconductor materials.ドキュメント
ドキュメントなし