説明
Axcelis HC GSD 200mm Software Version: VM (Virtual Machine) 8.0 CIM: SECS Process: HC Implant (B11, BF2, As and P) No Pumps, Chillers & Abatement 1 Blade Server構成
Handler System: ARM (Non HPES) Factory Interface: None Handler System Holder: (Non HPES) Options System: Silicon Disk Options System: SEF EGUN Main System: Axcelis GSD 200 E2 Handling System: In air HandlerOEMモデルの説明
The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.ドキュメント
ドキュメントなし
AXCELIS
GSD 200E2
カテゴリ
High Current
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Down
製品ID：
146005
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Axcelis HC GSD 200mm Software Version: VM (Virtual Machine) 8.0 CIM: SECS Process: HC Implant (B11, BF2, As and P) No Pumps, Chillers & Abatement 1 Blade Server構成
Handler System: ARM (Non HPES) Factory Interface: None Handler System Holder: (Non HPES) Options System: Silicon Disk Options System: SEF EGUN Main System: Axcelis GSD 200 E2 Handling System: In air HandlerOEMモデルの説明
The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.ドキュメント
ドキュメントなし