説明
説明なし構成
IMPLANTER_HIGH CURRENTOEMモデルの説明
The NV-GSD III-80 is a high-current ion implanter that has become a de facto standard in the industry. It is versatile, supporting a medium-current range and various applications, thanks to its post-deflection acceleration system. It caters to different wafer sizes, supporting 5, 6, and 8-inch wafers. The implanter offers a wide range of implantation energy from 2 to 180 keV, facilitated by its unique acceleration mechanism. It also features a reliable batch transfer system for smooth operations and highly effective throughput for increased productivity. The NV-GSD III-80 ensures precise results with its reliable high-dose control accuracy and maintains the integrity of the process with its high beam quality that results in low metal contamination and low cross-contamination.ドキュメント
ドキュメントなし
カテゴリ
High Current
最終検証： 11日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
140463
ウェーハサイズ：
6"/150mm
ヴィンテージ：
2003
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AXCELIS
NV GSD III 180
カテゴリ
High Current
最終検証： 11日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
140463
ウェーハサイズ：
6"/150mm
ヴィンテージ：
2003
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
IMPLANTER_HIGH CURRENTOEMモデルの説明
The NV-GSD III-80 is a high-current ion implanter that has become a de facto standard in the industry. It is versatile, supporting a medium-current range and various applications, thanks to its post-deflection acceleration system. It caters to different wafer sizes, supporting 5, 6, and 8-inch wafers. The implanter offers a wide range of implantation energy from 2 to 180 keV, facilitated by its unique acceleration mechanism. It also features a reliable batch transfer system for smooth operations and highly effective throughput for increased productivity. The NV-GSD III-80 ensures precise results with its reliable high-dose control accuracy and maintains the integrity of the process with its high beam quality that results in low metal contamination and low cross-contamination.ドキュメント
ドキュメントなし