説明
ION IMPLANTATION SYSTEM Weight: 44,466 lb (20,170 kg)構成
構成なしOEMモデルの説明
The high current VIISta 80HP and VIISta 80 ion implanters feature a patented dual magnet ribbon beam architecture that currently provides the highest productivity, implant angle accuracy and 60 degree tilt angle capability—all of which are required for advanced device fabrication. Both tools have excellent process control capability for advanced ultra shallow junction applications, and can be used for source/drain, source drain extension, gate doping, pre-amorphization, and materials modification applications. Varian Semiconductor’s other high current tools include the VIISion 80 PLUS and VIISion 200 PLUS ion implanters.ドキュメント
ドキュメントなし
カテゴリ
High Current
最終検証： 4日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
147418
ウェーハサイズ：
不明
ヴィンテージ：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT) / VARIAN
VIISta 80
カテゴリ
High Current
最終検証： 4日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
147418
ウェーハサイズ：
不明
ヴィンテージ：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
ION IMPLANTATION SYSTEM Weight: 44,466 lb (20,170 kg)構成
構成なしOEMモデルの説明
The high current VIISta 80HP and VIISta 80 ion implanters feature a patented dual magnet ribbon beam architecture that currently provides the highest productivity, implant angle accuracy and 60 degree tilt angle capability—all of which are required for advanced device fabrication. Both tools have excellent process control capability for advanced ultra shallow junction applications, and can be used for source/drain, source drain extension, gate doping, pre-amorphization, and materials modification applications. Varian Semiconductor’s other high current tools include the VIISion 80 PLUS and VIISion 200 PLUS ion implanters.ドキュメント
ドキュメントなし