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APPLIED MATERIALS (AMAT) / VARIAN VIISta HCP
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The VIISta HCP series is a high current single wafer ion implanter that offers high productivity and excellent contamination performance. It features implant angle accuracy, beam steering correction, and high-tilt angle capability, making it suitable for advanced device fabrication. With its excellent process control capability, the VIISta HCP is ideal for advanced ultra shallow junction applications such as source/drain, source/drain extension, gate doping, pre-amorphization, and materials modification. It has an energy range of 200 eV to 60 keV and a dose range of 1 x 10^13 to 5 x 10^16 ions/cm^-2.
    ドキュメント

    APPLIED MATERIALS (AMAT) / VARIAN

    VIISta HCP

    verified-listing-icon

    検証済み

    カテゴリ

    High Current
    最終検証: 60日以上前
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    87178


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2006

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
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    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) / VARIAN VIISta HCP
    APPLIED MATERIALS (AMAT) / VARIANVIISta HCPHigh Current
    ヴィンテージ: 2006状態: 中古
    最終確認60日以上前

    APPLIED MATERIALS (AMAT) / VARIAN

    VIISta HCP

    verified-listing-icon

    検証済み

    カテゴリ

    High Current
    最終検証: 60日以上前
    listing-photo-09f3c7234bd34d10a42836a37cd267f7-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/44458/09f3c7234bd34d10a42836a37cd267f7/6c998fe26bcd49a7ac659e47110c60b9_c68a71ee07864761bf9eecd9ce2ff9a145005c_mw.jpeg
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    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    87178


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2006


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The VIISta HCP series is a high current single wafer ion implanter that offers high productivity and excellent contamination performance. It features implant angle accuracy, beam steering correction, and high-tilt angle capability, making it suitable for advanced device fabrication. With its excellent process control capability, the VIISta HCP is ideal for advanced ultra shallow junction applications such as source/drain, source/drain extension, gate doping, pre-amorphization, and materials modification. It has an energy range of 200 eV to 60 keV and a dose range of 1 x 10^13 to 5 x 10^16 ions/cm^-2.
    ドキュメント
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) / VARIAN VIISta HCP
    APPLIED MATERIALS (AMAT) / VARIAN
    VIISta HCP
    High Currentヴィンテージ: 2006状態: 中古最終検証: 60日以上前
    APPLIED MATERIALS (AMAT) / VARIAN VIISta HCP
    APPLIED MATERIALS (AMAT) / VARIAN
    VIISta HCP
    High Currentヴィンテージ: 0状態: 部品ツール最終検証: 60日以上前
    APPLIED MATERIALS (AMAT) / VARIAN VIISta HCP
    APPLIED MATERIALS (AMAT) / VARIAN
    VIISta HCP
    High Currentヴィンテージ: 2006状態: 中古最終検証: 60日以上前