説明
説明なし構成
構成なしOEMモデルの説明
The single wafer high current VIISta 80HP for advanced devices and VIISta 80 ion implanters feature a patented dual magnet ribbon beam architecture that currently provides the highest productivity, implant angle accuracy and 60 degree tilt angle capability—all of which are required for advanced device fabrication. Both tools have excellent process control capability for advanced ultra shallow junction applications, and can be used for source/drain, source drain extension, gate doping, pre-amorphization, and materials modification applications. Varian Semiconductor’s other high current tools include the VIISion 80 PLUS and VIISion 200 PLUS ion implanters.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT) / VARIAN
VIISta 80HP
検証済み
カテゴリ
High Current
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
21421
ウェーハサイズ:
不明
ヴィンテージ:
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示APPLIED MATERIALS (AMAT) / VARIAN
VIISta 80HP
検証済み
カテゴリ
High Current
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
21421
ウェーハサイズ:
不明
ヴィンテージ:
2001
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
The single wafer high current VIISta 80HP for advanced devices and VIISta 80 ion implanters feature a patented dual magnet ribbon beam architecture that currently provides the highest productivity, implant angle accuracy and 60 degree tilt angle capability—all of which are required for advanced device fabrication. Both tools have excellent process control capability for advanced ultra shallow junction applications, and can be used for source/drain, source drain extension, gate doping, pre-amorphization, and materials modification applications. Varian Semiconductor’s other high current tools include the VIISion 80 PLUS and VIISion 200 PLUS ion implanters.ドキュメント
ドキュメントなし