説明
説明なし構成
Compressor: CTI X 4EA Chamber Cryo Pump: CT-8 Source Dry Pump: Edward Beamline Dry Pump: Varian Diffusion L/L Rough Pump: EdwardOEMモデルの説明
The Varian 160XP is a high current ion implanter used in semiconductor manufacturing. It was manufactured by Varian in 1991 and operates on a voltage of 208 volts with a phase of 3+1. It is part of the XP series of ion implant systems by Varian.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT) / VARIAN
160XP
検証済み
カテゴリ
High Current
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
24736
ウェーハサイズ:
不明
ヴィンテージ:
1991
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示APPLIED MATERIALS (AMAT) / VARIAN
160XP
カテゴリ
High Current
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
24736
ウェーハサイズ:
不明
ヴィンテージ:
1991
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Compressor: CTI X 4EA Chamber Cryo Pump: CT-8 Source Dry Pump: Edward Beamline Dry Pump: Varian Diffusion L/L Rough Pump: EdwardOEMモデルの説明
The Varian 160XP is a high current ion implanter used in semiconductor manufacturing. It was manufactured by Varian in 1991 and operates on a voltage of 208 volts with a phase of 3+1. It is part of the XP series of ion implant systems by Varian.ドキュメント
ドキュメントなし