説明
説明なし構成
Gas module: N2, Ar, BF3, Ar (Walkup Only) Gas box without gas bottle Source area: Dual vaporizer Accelerator: 0.75 Mev column / Remote control for Ar stripper gas Beam filter: 10° Analysis power / 10° Chamber normal Injector: 60 keV Extraction possibility to 50 keV 110° Analysis power supply Process chamber: (9) Site disks (2) Gate valves for cryo pump, 12" Linear actuator assy for tilt scan transducer Wafer handler: (2) Loadlocks Dump loadlock for 6", 8" cast platform RPM: (3) iQDP80 Dry pump for source, ACCEL, chamber iQDP40 Dry pump Missing parts: 1000C Turbo for source (2) 1000 Turbo for ACCEL (2) Cryo pumps, 12" / 8500 Compressor.OEMモデルの説明
The Kestrel 750 is a high energy ion implanter that is the industry’s most cost-effective MeV implanter. It operates in the range of 10 - 3750 keV. Varian offers device makers the lowest cost, most practical MeV production solution with its Kestrel high energy implanter. Kestrel has distinct advantages in cost of ownership with its compact design, unique DC Tandetron accelerator, and large implant chamber. The simplicity of the Kestrel design sets this system apart from other MeV implanters and makes it the tool of choice for production MeV implants.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT) / VARIAN
KESTREL 750
検証済み
カテゴリ
High Energy
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
24051
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
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APPLIED MATERIALS (AMAT) / VARIAN
KESTREL 750
検証済み
カテゴリ
High Energy
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
24051
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Gas module: N2, Ar, BF3, Ar (Walkup Only) Gas box without gas bottle Source area: Dual vaporizer Accelerator: 0.75 Mev column / Remote control for Ar stripper gas Beam filter: 10° Analysis power / 10° Chamber normal Injector: 60 keV Extraction possibility to 50 keV 110° Analysis power supply Process chamber: (9) Site disks (2) Gate valves for cryo pump, 12" Linear actuator assy for tilt scan transducer Wafer handler: (2) Loadlocks Dump loadlock for 6", 8" cast platform RPM: (3) iQDP80 Dry pump for source, ACCEL, chamber iQDP40 Dry pump Missing parts: 1000C Turbo for source (2) 1000 Turbo for ACCEL (2) Cryo pumps, 12" / 8500 Compressor.OEMモデルの説明
The Kestrel 750 is a high energy ion implanter that is the industry’s most cost-effective MeV implanter. It operates in the range of 10 - 3750 keV. Varian offers device makers the lowest cost, most practical MeV production solution with its Kestrel high energy implanter. Kestrel has distinct advantages in cost of ownership with its compact design, unique DC Tandetron accelerator, and large implant chamber. The simplicity of the Kestrel design sets this system apart from other MeV implanters and makes it the tool of choice for production MeV implants.ドキュメント
ドキュメントなし
同様のリスト
すべて表示同様のリストが見つかりません