The IBS TM200S is an ion beam sputtering system manufactured by VCR Group. It is designed to deposit ultra-fine grain conductive films of metals or carbon onto sample surfaces, making it particularly useful for preparing samples for scanning electron microscopy (SEM) and transmission electron microscopy (TEM).

TM200S

scia

MILL 200

The Oxford Instruments Plasma Technology Ionfab 300 (including the 300 Plus version) is a compact, high-precision ion beam system designed for research, pilot production, and microfabrication.

OXFORD

Ionfab 300

The OPTORUN OTFC-1300 is a high-performance optical coating system that can accommodate chamber sizes ranging from φ 600mm to φ1800mm. It features a 60-point optical thickness monitor and an RF ion source that achieves uniform ion beam distribution over a larger area at high ion current density. The system is capable of depositing over 100 layers using 2 EB guns and a multi-point crucible hearth or annular hearth. It also includes an auto-deposition control system for fully automated processes and offers the option of selecting either a center-driving or planetary substrate dome. The system uses diffusion pumps in combination with Polycold or Cryo-pumps.

Ion Beam / IBD

概要（Overview）

サービス

Ion Beam / IBD のメーカー

Ion Beam / IBD のトップ製品

TM200S

MILL 200

Ionfab 300

OTFC-1300