The Ionfab 300 Plus from Oxford Instruments is a tool that uses ion beam technology for etching and deposition. It is part of the Ionfab 300 series and is designed to be versatile for multiple applications. The system has several hardware options, including open load, single substrate load lock, and cassette to cassette. It can also be configured to work with other plasma etch and deposition tools, either with a single wafer loadlock or cluster wafer handling. The Ionfab 300 Plus has several modes of operation, including ion beam etching (IBE), reactive ion beam etching (RIBE), chemically assisted ion beam etching (CAIBE), reactive ion beam deposition (RIBD), ion beam sputter deposition (IBSD), and ion assisted sputter deposition (IASD)

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IONFAB 300 PLUS

The Oxford Instruments Plasma Technology Ionfab 300 (including the 300 Plus version) is a compact, high-precision ion beam system designed for research, pilot production, and microfabrication.

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トップOXFORD Ion Beam / IBD

IONFAB 300 PLUS

Ionfab 300

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ION FAB 300IBE

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すべてのOXFORD Ion Beam / IBD