説明

[Overview] SC-9200 is a high-precision, Semi-Automated Wafer Surface Contamination Recovery Device. Specially designed for Vapor Phase Decomposition (VPD) and wafer surface liquid phase droplet scanning (WSD /WSL), these tools serve as the perfect pre-treatment / sample preparation solution for ICP-MS and TXRF trace metal analysis. Ideal cost-effective alternative for semiconductor R&D labs and foundry QA/QC pipelines seeking reliable wafer contamination control. [Key Features & Specifications] • Condition: 100% Brand New (Never used, direct from source in original packaging) • Vintage: 2026 • Manufacturer: NAS Giken, Inc. • Wafer Size Compatibility: Suitable for various flat surfaces, with a size of 4”/4 inch (100mm), 5”/5 inch (125mm), 6”/6 inch (150mm), 8”/8 inch (200mm), 12”/12 inch (300mm). • Recovery Capabilities: Efficiently collects contaminants from hydrophobic/hydrophilic surfaces, and hydrophobic wafer edges (Bevel). • Sampling Excellence: Delivers stable, high-purity performance (supporting ppm, ppb, and ppt levels) utilizing quasi-concentric or pseudo-concentric sampling methods. • Operation & Environment: Extremely easy to operate. This series must be used inside a clean bench and in conjunction with a VPDBOX. [Pricing, Shipping & Installation] • Standard Lead Time: Crating and shipping will be processed within two months upon receipt of order, followed by on-site installation and commissioning. • Price Notice: Final pricing is subject to fluctuations in the JPY/USD (Yen-Dollar) exchange rate.

構成

Device Name: SC-9200 (Perfect for R&D and QC Labs) Wafer Semi-Auto Device of Surface Trace Metal Contamination Recovery for VPD-WSD / VPD-WSL/ICP-MS/TXRF Treatment; Operation: by PC; Attaching / Detaching Liquid Holders: Auto; Supply of Sampling Liquid: Auto; Collection of Sampling Liquid: Auto; Basic Sampling Pattern: Ring-shaped, Fan-shaped, Fixed, Radius, Arc; Additional Sampling Pattern (*1): Side (Bevel), Rectangle, Circular Segment; Orientation Flat (*2): Added to sampling pattern of Ring-shaped, Fixed Radius, Side (Bevel); Auto Cleaning of Liquid Holders: Yes; Sucking-Up Type Collection of Liquid: Yes; Sampling of Hydrophilic Surface: Yes; Size (WxDxH): 690mmx550mmx790mm; Weight: 55Kg; Recommended Environment: Inside Clean Draft; Utilities: AC-100-240V, DIW, N2, CDA. *1-2: Those options will be quoted separately.

OEMモデルの説明

A semi-automated recovery system designed to collect trace nano-level metallic contaminants from the front and side surfaces of silicon wafers and compound semiconductor wafers. It ensures high analytical precision while minimizing the risk of human contamination.