説明
Primarily used for writing lithography masks with pre-spun photoresist. Recently replaced the laser interferometer encoder and temperature controller for the environmental chamber Manuals are included for the tool, conversion software, laser encoder, and temperature controller.構成
405nm laser with a 4mm write head Working software both to convert and write on two computers (GDSII was the go-to format, has other file format options, including Grayscale Can handle large substrates up to 9x9" Maximum write field up to 200mmOEMモデルの説明
提供なしドキュメント
ドキュメントなし
カテゴリ
Lithography
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
145810
ウェーハサイズ：
不明
ヴィンテージ：
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HEIDELBERG INSTRUMENTS
DWL 66FS
カテゴリ
Lithography
最終検証： 3日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
145810
ウェーハサイズ：
不明
ヴィンテージ：
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Primarily used for writing lithography masks with pre-spun photoresist. Recently replaced the laser interferometer encoder and temperature controller for the environmental chamber Manuals are included for the tool, conversion software, laser encoder, and temperature controller.構成
405nm laser with a 4mm write head Working software both to convert and write on two computers (GDSII was the go-to format, has other file format options, including Grayscale Can handle large substrates up to 9x9" Maximum write field up to 200mmOEMモデルの説明
提供なしドキュメント
ドキュメントなし