説明

Optical direct-write lithography system Semi-automated alignment capability Writing speed: 44 mm2/min An estimated 5000 hrs on LED light source

構成

Features Maximum substrate size: 6" x 6" Minimum substrate size: 6x 6 mm² Substrate thickness: 0 to 6 mm Encoder resolution: 20 nm Optical system including highly reflective mirrors and DMDTM Real-time air-gauge autofocus with dynamic range of 80 µm Camera system for substrate inspection, automatic alignment, and basic measurement functions Basic gray scale exposure mode with 128 intensity levels Conversion software for DXF, CIF, GDSII, and Gerber files for binary exposures and BMP, STL, and ASCII files for gray scale LED Illumination Module (390nm) Minimum structure size [µm]: 1 Address grid [nm]: 50 Edge roughness [30, nm]: 100 Line width uniformity [30, nm]: 200 Alignment Accuracy [30, nm]: 200 Write speed [mm2/minute]: 50 Maximum write area [mm x mm]: 125 x 125

OEMモデルの説明

The µPG 501 is a tabletop maskless aligner system (Figure 1). It can be used for direct-writing as well as for making photomasks. It uses 390 nm LED light source and optical system comprising highly reflective mirrors and DMDTM (digital micro-mirror device).