メインコンテンツにスキップ
Moov logo

Moov Icon
HITACHI HL-7000M
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    ドキュメント

    ドキュメントなし

    HITACHI

    HL-7000M

    verified-listing-icon

    検証済み

    カテゴリ

    Lithography
    最終検証: 60日以上前
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    45596


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    HITACHI HL-7000M
    HITACHIHL-7000MLithography
    ヴィンテージ: 0状態: 中古
    最終確認30日前

    HITACHI

    HL-7000M

    verified-listing-icon

    検証済み

    カテゴリ

    Lithography
    最終検証: 60日以上前
    listing-photo-6874e5c1164e48efa3cdfb265f2b3eb0-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    45596


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    HITACHI HL-7000M
    HITACHI
    HL-7000M
    Lithographyヴィンテージ: 0状態: 中古最終検証: 30日前
    HITACHI HL-7000M
    HITACHI
    HL-7000M
    Lithographyヴィンテージ: 0状態: 中古最終検証: 60日以上前