説明
-E-beam lithography system w/ SEM -Column was replaced 5 years ago -Has a Scanning Electron Microscope to facilitate imaging and navigation of the sample -Had a service contract until 2 years ago, has been idle for a couple years -Hardware and key components are in good shape -The computer was upgraded構成
SEM inspection and sample navigation * Image resolution: 2.0 nm @ 20 kV 4.0 nm @ 1 kVOEMモデルの説明
The RAITH150 is a multipurpose tool that can perform direct e-beam exposure and wafer scale process development at suboptical resolution. It includes integrated linewidth and metrology functions that optimize process reproducibility. The SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.ドキュメント
ドキュメントなし
検証済み
カテゴリ
Lithography
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
131301
ウェーハサイズ：
不明
ヴィンテージ：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
RAITH
150 E BEAM
カテゴリ
Lithography
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
131301
ウェーハサイズ：
不明
ヴィンテージ：
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
-E-beam lithography system w/ SEM -Column was replaced 5 years ago -Has a Scanning Electron Microscope to facilitate imaging and navigation of the sample -Had a service contract until 2 years ago, has been idle for a couple years -Hardware and key components are in good shape -The computer was upgraded構成
SEM inspection and sample navigation * Image resolution: 2.0 nm @ 20 kV 4.0 nm @ 1 kVOEMモデルの説明
The RAITH150 is a multipurpose tool that can perform direct e-beam exposure and wafer scale process development at suboptical resolution. It includes integrated linewidth and metrology functions that optimize process reproducibility. The SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.ドキュメント
ドキュメントなし