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6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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RAITH 150 TWO
    説明
    説明なし
    構成
    -Low kV Exposure and Imaging with Inlens SE Detector with BSE Detector Option -Accelerating Voltage up to 30kV -20 MHz Digital Pattern Generator -Stitching and Overlay Accuracy about 35nm
    OEMモデルの説明
    The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.
    ドキュメント

    ドキュメントなし

    RAITH

    150 TWO

    verified-listing-icon

    検証済み

    カテゴリ
    Lithography

    最終検証: 28日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    Installed / Idle


    製品ID:

    114027


    ウェーハサイズ:

    6"/150mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    RAITH 150 TWO

    RAITH

    150 TWO

    Lithography
    ヴィンテージ: 0状態: 中古
    最終確認28日前

    RAITH

    150 TWO

    verified-listing-icon
    検証済み
    カテゴリ
    Lithography
    最終検証: 28日前
    listing-photo-954df4f54c4a46b18ff206e60a2f47e5-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/83967/954df4f54c4a46b18ff206e60a2f47e5/81a01d81c5d34f368cf0596b659373d2_38306936112c4f5a9acad8a3e4ca7d7c_mw.jpeg
    listing-photo-954df4f54c4a46b18ff206e60a2f47e5-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/83967/954df4f54c4a46b18ff206e60a2f47e5/0a7a4b14e0a84fffab4bdceb026ec3ba_0df71e1468df483abf9d1e38e28d01531201a_mw.jpeg
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    Installed / Idle


    製品ID:

    114027


    ウェーハサイズ:

    6"/150mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    -Low kV Exposure and Imaging with Inlens SE Detector with BSE Detector Option -Accelerating Voltage up to 30kV -20 MHz Digital Pattern Generator -Stitching and Overlay Accuracy about 35nm
    OEMモデルの説明
    The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    RAITH 150 TWO

    RAITH

    150 TWO

    Lithographyヴィンテージ: 0状態: 中古最終検証:28日前