説明
説明なし構成
構成なしOEMモデルの説明
Tailored for all direct-write applications, the EBPG5150 is specifically optimized for a 155 mm by 155 mm stage, utilizing the universal plinth platform shared with the EBPG5200. Its versatile design allows for loading different sample sizes and quantities, accommodating anything from individual piece parts to full wafer sizes with ease.ドキュメント
ドキュメントなし
RAITH
EBPG5150
カテゴリ
Lithography
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
150707
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
Tailored for all direct-write applications, the EBPG5150 is specifically optimized for a 155 mm by 155 mm stage, utilizing the universal plinth platform shared with the EBPG5200. Its versatile design allows for loading different sample sizes and quantities, accommodating anything from individual piece parts to full wafer sizes with ease.ドキュメント
ドキュメントなし