説明
High Resolution FIB-SEM, with Lithography capability -Excellent beam spot and low beam tails -FIB nano-fabrication beyond Gallium -Sub-10 nm FIB nano-fabrication -NanoFabrication with ion species beyond Gallium -Rapid, versatile manual operation -Advanced lithographic automated operation -Direct Patterning Ion milling -Exposure of photoresist, maskless ion implanting and hard masking. -Ion beam induced deposition, and gas-assisted etching -Cross-sectioning and sample preparation -Circuit editting and modification -Laser Interferometer stage allows field stitching and continuous write -Cartesian Nanomanipulators allow in-situ probing and Nanoprofiling -It has automated focus control -It is fitted with various optical cameras構成
構成なしOEMモデルの説明
提供なしドキュメント
ドキュメントなし
カテゴリ
Lithography
最終検証： 4日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled
製品ID：
148405
ウェーハサイズ：
不明
ヴィンテージ：
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
RAITH
ionLINE Plus
カテゴリ
Lithography
最終検証： 4日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled
製品ID：
148405
ウェーハサイズ：
不明
ヴィンテージ：
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
High Resolution FIB-SEM, with Lithography capability -Excellent beam spot and low beam tails -FIB nano-fabrication beyond Gallium -Sub-10 nm FIB nano-fabrication -NanoFabrication with ion species beyond Gallium -Rapid, versatile manual operation -Advanced lithographic automated operation -Direct Patterning Ion milling -Exposure of photoresist, maskless ion implanting and hard masking. -Ion beam induced deposition, and gas-assisted etching -Cross-sectioning and sample preparation -Circuit editting and modification -Laser Interferometer stage allows field stitching and continuous write -Cartesian Nanomanipulators allow in-situ probing and Nanoprofiling -It has automated focus control -It is fitted with various optical cameras構成
構成なしOEMモデルの説明
提供なしドキュメント
ドキュメントなし