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SAPPHIRE 100E

カテゴリ
Lithography
概要(Overview)

The Sapphire 100, was developed for the manufacturing of high-brightness light-emitting diodes (HBLEDs). The Sapphire 100 system is intended to assist Ultratech’s customers in meeting the increasing demand for illumination products that utilize HBLED technology. Additionally, the Sapphire 100 system incorporates Ultratech’s patented Machine Vision System (MVS), which provides enhanced alignment flexibility and significant benefits over traditional alignment methods. The system is suitable for use in a variety of applications, including HBLEDs, semiconductor fabrication, nanotechnology, and advanced packaging (through the AP series).

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