説明
-ghi-line stepper -Working condition, no known issues構成
• 2 um ghi-line Broadband Lens • Windows Base Operator Station • Robotic Loader (60 minute wafer size change) • PATMAX MVS Alignment System • 3 X 5 Inch Reticle • 6 inch Wafers • 30 X 15 Field size - Manual Aperture • Lens Distortion Reference - No Lens Matching • 115V Power Source • Four Color Signal Light Tower • Single Probe Focus Software • Focus Mapping (Grid Focus)Software • MVS Manual Alignment Software • Topside EGA Software • Step Specific Process Modes Software • Focus Mode: SPF SoftwareOEMモデルの説明
The Sapphire 100, was developed for the manufacturing of high-brightness light-emitting diodes (HBLEDs). The Sapphire 100 system is intended to assist Ultratech’s customers in meeting the increasing demand for illumination products that utilize HBLED technology. Additionally, the Sapphire 100 system incorporates Ultratech’s patented Machine Vision System (MVS), which provides enhanced alignment flexibility and significant benefits over traditional alignment methods. The system is suitable for use in a variety of applications, including HBLEDs, semiconductor fabrication, nanotechnology, and advanced packaging (through the AP series).ドキュメント
ドキュメントなし
VEECO / ULTRATECH
SAPPHIRE 100E
検証済み
カテゴリ
Lithography
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Running
製品ID：
90682
ウェーハサイズ：
不明
ヴィンテージ：
2018
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
VEECO / ULTRATECH
SAPPHIRE 100E
カテゴリ
Lithography
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Running
製品ID：
90682
ウェーハサイズ：
不明
ヴィンテージ：
2018
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
-ghi-line stepper -Working condition, no known issues構成
• 2 um ghi-line Broadband Lens • Windows Base Operator Station • Robotic Loader (60 minute wafer size change) • PATMAX MVS Alignment System • 3 X 5 Inch Reticle • 6 inch Wafers • 30 X 15 Field size - Manual Aperture • Lens Distortion Reference - No Lens Matching • 115V Power Source • Four Color Signal Light Tower • Single Probe Focus Software • Focus Mapping (Grid Focus)Software • MVS Manual Alignment Software • Topside EGA Software • Step Specific Process Modes Software • Focus Mode: SPF SoftwareOEMモデルの説明
The Sapphire 100, was developed for the manufacturing of high-brightness light-emitting diodes (HBLEDs). The Sapphire 100 system is intended to assist Ultratech’s customers in meeting the increasing demand for illumination products that utilize HBLED technology. Additionally, the Sapphire 100 system incorporates Ultratech’s patented Machine Vision System (MVS), which provides enhanced alignment flexibility and significant benefits over traditional alignment methods. The system is suitable for use in a variety of applications, including HBLEDs, semiconductor fabrication, nanotechnology, and advanced packaging (through the AP series).ドキュメント
ドキュメントなし