説明

1.1 The MPA-600 lithography equipment is second-hand equipment. After debugging, it should meet the requirements of automatic exposure of 6-inch silicon wafers. 1.2 The lighting source is a high-pressure spherical mercury lamp with a spectrum of G/H/I mixed lines. 1.3 The exposure method is 1:1 projection of the pattern on the reticle onto the wafer and exposure in a scanning manner. 1.4 Operation mode: manual and semi-automatic exposure modes, easy to operate and maintain. 1.5 High efficiency and good stability. 1.6 There is sufficient supply of spare parts

構成

Mask Aligner

OEMモデルの説明

The Canon MPA-600FA is a high-throughput mirror projection mask aligner delivers stable performance ideal for VLSI chip production, boasting a 1.5um resolution and +/- 6um depth-of-focus across the entire field for 4”, 5”, and 6” wafers. With field-proven auto alignment via laser scanning, target placement in scribe lines, and seamless compatibility for mix-and-match with steppers, it's a top-tier solution for precision alignments.