説明
Status - Installed, power off QUINTEL Q4000 is a soft-etching, contact-based mask aligner. It is designed to enable precise, high-yield lithography processes used for the production of semiconductor devices, MEMS, and other microscale components. It is also used for the production of other nanostructure and nanoscale devices. The machinery is composed of a scanning stage, a mechanical assembly, an optical imaging equipment, and ancillaries. The scanning stage consists of two orthogonal axes of motion, an X-axis and a Y-axis. This allows the mask to be precisely positioned in the optical field-of-view. The mechanical assembly is designed to ensure optimal mechanical tolerances for dimensional accuracy, flatness, and leveling of the masks. This is essential for achieving the highest possible lithographic throughput.構成
構成なしOEMモデルの説明
提供なしドキュメント
ドキュメントなし
QUINTEL
Q 4000
検証済み
カテゴリ
Mask/Bond Aligners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Down
製品ID：
103539
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
QUINTEL
Q 4000
カテゴリ
Mask/Bond Aligners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Down
製品ID：
103539
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Status - Installed, power off QUINTEL Q4000 is a soft-etching, contact-based mask aligner. It is designed to enable precise, high-yield lithography processes used for the production of semiconductor devices, MEMS, and other microscale components. It is also used for the production of other nanostructure and nanoscale devices. The machinery is composed of a scanning stage, a mechanical assembly, an optical imaging equipment, and ancillaries. The scanning stage consists of two orthogonal axes of motion, an X-axis and a Y-axis. This allows the mask to be precisely positioned in the optical field-of-view. The mechanical assembly is designed to ensure optimal mechanical tolerances for dimensional accuracy, flatness, and leveling of the masks. This is essential for achieving the highest possible lithographic throughput.構成
構成なしOEMモデルの説明
提供なしドキュメント
ドキュメントなし