The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.

ULVAC

SOPHI-200

The Varian E220 is a medium current ion implanter that was used for research and development purposes. It was first introduced in 1993 and has had minimal usage. The tool has undergone several updates, including a new monitor, rebuilt turbo, and replaced gas box.

November 10, 2011 – Applied Materials, Inc. announced the successful completion of its acquisition of Varian Semiconductor Equipment Associates, Inc. 
Varian is the leading supplier of ion implantation equipment used by chip makers and has been applying this technology to crystalline silicon wafers for photovoltaic panels. Varian will operate as a business unit of Applied's Silicon Systems Group.

APPLIED MATERIALS (AMAT) / VARIAN

E220

The VIISion 80 ion implanter beam line incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer.

VIISion 80

The VARIAN E500 is a medium current ion implanter system designed for use with 150mm wafer sizes. This system is capable of delivering precise and accurate implantation of ions into semiconductor wafers, making it an essential tool in the manufacturing of semiconductor devices.

Medium Current

概要（Overview）

サービス

Medium Current のメーカー

Medium Current のトップ製品

SOPHI-200

E220

VIISion 80

E500