SOPHI-200
カテゴリ
Medium Current概要（Overview）
The SOPHI-200 is a compact ion implanter designed by ULVAC using their latest advanced technology. It is capable of running substrate sizes up to 200mm in diameter and comes in two energy ranges: up to 200KeV or up to 260KeV. This system is a powerful tool for ion implantation and is suitable for a wide range of applications.
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