説明
説明なし構成
Lithography Equipmentin Metrology EquipmentKLA Tencor,OEMモデルの説明
The KLA 5200 is an overlay metrology system that helps chipmakers improve process control and reduce time to market for advanced products with feature sizes down to .18 µm. It uses Coherence Probe Microscopy (CPM) to identify surfaces and can measure all layers, including low-contrast or grainy targets. The KLA 5200 can lower stepper cost-of-ownership by providing high-quality data to prevent lithography process errors, helping manage the overlay budget and maximizing lithography output.ドキュメント
ドキュメントなし
KLA
5200
検証済み
カテゴリ
Metrology
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
97175
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
5200
検証済み
カテゴリ
Metrology
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
97175
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Lithography Equipmentin Metrology EquipmentKLA Tencor,OEMモデルの説明
The KLA 5200 is an overlay metrology system that helps chipmakers improve process control and reduce time to market for advanced products with feature sizes down to .18 µm. It uses Coherence Probe Microscopy (CPM) to identify surfaces and can measure all layers, including low-contrast or grainy targets. The KLA 5200 can lower stepper cost-of-ownership by providing high-quality data to prevent lithography process errors, helping manage the overlay budget and maximizing lithography output.ドキュメント
ドキュメントなし