説明
説明なし構成
構成なしOEMモデルの説明
The Metra 7200 is Nanometrics’ advanced overlay metrology and CD measurement system. The Metra’s high throughput and on-board, real-time, stepper-specific modeling provides the fastest time-to-decision for making accurate stepper adjustments. The Metra’s stepper-specific modeling software analyzes every unique stage and lens term to provide the tightest overlay possible, directly improving device performance and yield. Complete analysis can be performed for any stepper including Nikon, Canon, SVGL and Ultratech. The Metra’s analysis uses an embedded version of the ARGUS® stepper modeling library developed by New Vision Systems. In addition, the system’s multi-tasking Windows NT®-based software allows engineering functions, such as recipe creation, to occur simultaneously while production wafers are being measured, thus providing high equipment utilization.ドキュメント
ドキュメントなし
カテゴリ
Metrology
最終検証： 16日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
141241
ウェーハサイズ：
6"/150mm
ヴィンテージ：
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NANOMETRICS / METRA
7200
カテゴリ
Metrology
最終検証： 16日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
141241
ウェーハサイズ：
6"/150mm
ヴィンテージ：
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
The Metra 7200 is Nanometrics’ advanced overlay metrology and CD measurement system. The Metra’s high throughput and on-board, real-time, stepper-specific modeling provides the fastest time-to-decision for making accurate stepper adjustments. The Metra’s stepper-specific modeling software analyzes every unique stage and lens term to provide the tightest overlay possible, directly improving device performance and yield. Complete analysis can be performed for any stepper including Nikon, Canon, SVGL and Ultratech. The Metra’s analysis uses an embedded version of the ARGUS® stepper modeling library developed by New Vision Systems. In addition, the system’s multi-tasking Windows NT®-based software allows engineering functions, such as recipe creation, to occur simultaneously while production wafers are being measured, thus providing high equipment utilization.ドキュメント
ドキュメントなし