説明
Film Thickness Measurement System構成
構成なしOEMモデルの説明
The SpectraLASER 200 XL is a product by Rudolph Technologies that provides repeatable t, n, and k measurements for semiconductor process control. It uses intense laser light for small-spot measurements on product wafers in various applications, including CMP, CVD, diffusion, lithography, and etch. The stable laser light output and long laser lifetimes (20-30,000 hours) ensure system-to-system matching and measurement stability. The product also features a deep UV reflectometer and simultaneous multiple angle of incidence data acquisition for optimum sensitivity. These capabilities allow the SpectraLASER 200 XL to characterize new semiconductor manufacturing processes and maintain control over them long term.ドキュメント
ドキュメントなし
ONTO / RUDOLPH / AUGUST
SpectraLASER 200 XL
検証済み
カテゴリ
Metrology
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
104576
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ONTO / RUDOLPH / AUGUST
SpectraLASER 200 XL
カテゴリ
Metrology
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
104576
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Film Thickness Measurement System構成
構成なしOEMモデルの説明
The SpectraLASER 200 XL is a product by Rudolph Technologies that provides repeatable t, n, and k measurements for semiconductor process control. It uses intense laser light for small-spot measurements on product wafers in various applications, including CMP, CVD, diffusion, lithography, and etch. The stable laser light output and long laser lifetimes (20-30,000 hours) ensure system-to-system matching and measurement stability. The product also features a deep UV reflectometer and simultaneous multiple angle of incidence data acquisition for optimum sensitivity. These capabilities allow the SpectraLASER 200 XL to characterize new semiconductor manufacturing processes and maintain control over them long term.ドキュメント
ドキュメントなし