説明
Non-contact electrical C-V & I-V measurement system capable of measuring on product wafers. Measurements can be made in scribe line test sites or in the active cell area. Cell measurements allow for the first time in-line electrical monitoring of topology related processing issues. Major applications include measurements of SiO2, Nitrided Oxides, advanced high-K and low-K dielectrics構成
構成なしOEMモデルの説明
The SEMILAB FAaST 200 SL is a Wafer Mask Inspection system. The FAaST 200 SL can produce wafer size of 8” and Measurements can be made in scribe line test sites or in the active cell area. Cell measurements allow for the first time in-line electrical monitoring of topology related processing issuesドキュメント
ドキュメントなし
SEMILAB
FAAST 200 SL
検証済み
カテゴリ
Metrology
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
23624
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEMILAB
FAAST 200 SL
カテゴリ
Metrology
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
23624
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Non-contact electrical C-V & I-V measurement system capable of measuring on product wafers. Measurements can be made in scribe line test sites or in the active cell area. Cell measurements allow for the first time in-line electrical monitoring of topology related processing issues. Major applications include measurements of SiO2, Nitrided Oxides, advanced high-K and low-K dielectrics構成
構成なしOEMモデルの説明
The SEMILAB FAaST 200 SL is a Wafer Mask Inspection system. The FAaST 200 SL can produce wafer size of 8” and Measurements can be made in scribe line test sites or in the active cell area. Cell measurements allow for the first time in-line electrical monitoring of topology related processing issuesドキュメント
ドキュメントなし