説明
Installed and running Equipment status: Operational.構成
Previously, the GaN growth was on 4-inch wafers, now it's on 6-inch wafers, all in six pieces. Schematic and circuit data for the equipment. Equipment: Photos of the reaction chamber (upper, inside, and below), and gas source piping with equipment door open. Human-machine interface software version: EpiTT_TWO. PLC, SLC, and RF generator details.OEMモデルの説明
The AIXTRON AIX 2800 G4 is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. This cutting-edge system is specifically designed for epitaxial growth of compound semiconductor materials, with a primary focus on producing high-performance optoelectronic devices like light-emitting diodes (LEDs) and laser diodes. Its precise and controlled growth process enables the creation of high-quality semiconductor layers, making it a crucial tool for manufacturing optoelectronic components used in various applications, including lighting, displays, telecommunications, and other high-performance electronic devices.ドキュメント
AIXTRON
AIX 2800 G4
検証済み
カテゴリ
MOCVD
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Running
製品ID：
100029
ウェーハサイズ：
6"/150mm
ヴィンテージ：
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AIXTRON
AIX 2800 G4
検証済み
カテゴリ
MOCVD
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Running
製品ID：
100029
ウェーハサイズ：
6"/150mm
ヴィンテージ：
2008
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available