説明
Aixtron CRIUS CCS Aixtron CRIUS CCS System - CRIUS Si-III/V tool for laser-on-silicon - (CCS) 300mm CRIUS cluster system, the system Including two silicon-based and III/V-based MOCVD modules, the application is particularly suitable for growing III/V compound semiconductors on commercially available silicon wafers. Diode lasers are made from a dilute nitride Ga (NAsP) material system deposited on silicon. Ga(NAsP) is particularly suitable for realizing next-generation 850nm diode lasers for data communications. In addition to laser-on-silicon integration, such devices will play a very important role in the future, especially when considering CMOS on-silicon. When used in applications such as III/V.構成
構成なしOEMモデルの説明
The AIXTRON CRIUS is a metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE, a leading provider of deposition equipment used in the semiconductor industry. The CRIUS series is designed for the epitaxial growth of compound semiconductor materials, offering advanced features and capabilities.ドキュメント
ドキュメントなし
AIXTRON
CRIUS
検証済み
カテゴリ
MOCVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled
製品ID：
104132
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
AIXTRON
CRIUS
カテゴリ
MOCVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled
製品ID：
104132
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Aixtron CRIUS CCS Aixtron CRIUS CCS System - CRIUS Si-III/V tool for laser-on-silicon - (CCS) 300mm CRIUS cluster system, the system Including two silicon-based and III/V-based MOCVD modules, the application is particularly suitable for growing III/V compound semiconductors on commercially available silicon wafers. Diode lasers are made from a dilute nitride Ga (NAsP) material system deposited on silicon. Ga(NAsP) is particularly suitable for realizing next-generation 850nm diode lasers for data communications. In addition to laser-on-silicon integration, such devices will play a very important role in the future, especially when considering CMOS on-silicon. When used in applications such as III/V.構成
構成なしOEMモデルの説明
The AIXTRON CRIUS is a metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE, a leading provider of deposition equipment used in the semiconductor industry. The CRIUS series is designed for the epitaxial growth of compound semiconductor materials, offering advanced features and capabilities.ドキュメント
ドキュメントなし