説明

Reticle / Mask Defect Inspection System

構成

· Factory Interface (FI) with 1 loadport for SMIF pod RSP-200 · Separate electronic cabinets reduce footprint of main tool and separates heat generation sources. · Separate pre climatization unit to supply conditioned air for main chamber environment control. · Operator desk with dual monitors for simultaneous view of tool PC and station controller. · Transfer Chamber o 6 axis external handling robot for moving masks from loadport to library to internal handling systems o Internal handling robot interfaces with fine alignment station for accurate mask edge detection. o Mask library can accommodate 10 masks within the tool at any time. · Process Chamber o Temperature and humidity controlled chamber o Ultra precision stage for measuring mask in face up position. o Stage rests on advanced damping devices to achieve optimal registration repeatability. · Imaging optics o 193nm excimer source with a 25um field of view capable of registration measurements in both reflection and transmission mode o Capable of through pellicle measurements for optical masks. o Red vis camera for coarse alignment and mask position measurements. o Measurement speed is 600 sites per hour with 5 plane measurements and up to 1000 sites per hour with 1 plane measurement · Performance for both reflection and transmission mode measurements: o Long term registration repeatability of < 0.55nm with first order corrections and <0.8nm with 0th order corrections o Registration accuracy < 0.95nm o Screen linearity < 1nm o Centrality repeatability <10um