説明
[OPM NEW & 2nd SOURCE NEW ONLY] - Technical Specifications: 1. Core Performance & Thermal Properties Operating Temperature: Recommended up to < 700°C (Optimal for AlN stability). Thermal Conductivity: High-performance 170 W/m·K for superior heat transfer. Temperature Uniformity: Excellent distribution across the entire 200mm surface. Thermal Expansion: Coefficient similar to Silicon (Si), minimizing wafer stress and slippage during thermal cycling. 2. Material Reliability Plasma Resistance: Excellent durability against erosive cleaning gases (NF3, CF4, etc.). Anti-Corrosion: High resistance to chemical attack in aggressive deposition environments. Durability: Engineered for long-lifecycle performance in high-duty cycle fabs. 3.Applications This heater assembly is specifically designed for high-precision semiconductor vacuum processes: CVD (Chemical Vapor Deposition) ALD (Atomic Layer Deposition) Diffusion Annealing構成
構成なしOEMモデルの説明
Ceramic Heater Assyドキュメント
ドキュメントなし
カテゴリ
Parts
最終検証： 昨日
主なアイテムの詳細
状態：
New
稼働ステータス:
Deinstalled
製品ID：
145694
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
0010-03840
カテゴリ
Parts
最終検証： 昨日
主なアイテムの詳細
状態：
New
稼働ステータス:
Deinstalled
製品ID：
145694
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
[OPM NEW & 2nd SOURCE NEW ONLY] - Technical Specifications: 1. Core Performance & Thermal Properties Operating Temperature: Recommended up to < 700°C (Optimal for AlN stability). Thermal Conductivity: High-performance 170 W/m·K for superior heat transfer. Temperature Uniformity: Excellent distribution across the entire 200mm surface. Thermal Expansion: Coefficient similar to Silicon (Si), minimizing wafer stress and slippage during thermal cycling. 2. Material Reliability Plasma Resistance: Excellent durability against erosive cleaning gases (NF3, CF4, etc.). Anti-Corrosion: High resistance to chemical attack in aggressive deposition environments. Durability: Engineered for long-lifecycle performance in high-duty cycle fabs. 3.Applications This heater assembly is specifically designed for high-precision semiconductor vacuum processes: CVD (Chemical Vapor Deposition) ALD (Atomic Layer Deposition) Diffusion Annealing構成
構成なしOEMモデルの説明
Ceramic Heater Assyドキュメント
ドキュメントなし