説明
[2nd SOURCE NEW ONLY] Core Features & Properties Type: Plasma Chuck Assembly (C-Chuck). Wafer Size: Optimized for 200mm (8-inch) platforms. Compatibility: Designed for Centura and Precision 5000 (P5000) series. Material: High-durability ceramic/metal composite engineered for vacuum plasma environments. Process Application Etch & PECVD: Ideal for plasma-enhanced processes requiring stable wafer clamping and RF grounding. Durability: High resistance to plasma erosion and chemical corrosion.構成
構成なしOEMモデルの説明
提供なしドキュメント
ドキュメントなし
カテゴリ
Parts
最終検証： 5日前
主なアイテムの詳細
状態：
New
稼働ステータス:
Deinstalled
製品ID：
145691
ウェーハサイズ：
6"/150mm, 8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
0010-02737
カテゴリ
Parts
最終検証： 5日前
主なアイテムの詳細
状態：
New
稼働ステータス:
Deinstalled
製品ID：
145691
ウェーハサイズ：
6"/150mm, 8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
[2nd SOURCE NEW ONLY] Core Features & Properties Type: Plasma Chuck Assembly (C-Chuck). Wafer Size: Optimized for 200mm (8-inch) platforms. Compatibility: Designed for Centura and Precision 5000 (P5000) series. Material: High-durability ceramic/metal composite engineered for vacuum plasma environments. Process Application Etch & PECVD: Ideal for plasma-enhanced processes requiring stable wafer clamping and RF grounding. Durability: High resistance to plasma erosion and chemical corrosion.構成
構成なしOEMモデルの説明
提供なしドキュメント
ドキュメントなし