説明
APPLIED MATERIALS AMAT AKT 25 K GEN 6 PECVD CHAMBER ONLY構成
Chambers were never commisioned and remain in “new” unused condition. Sold “AS IS” Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: ASTRON HF+, AX7636-04OEMモデルの説明
AKT-25K PECVD(1,500mm x 1,850mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafersドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
25K PECVD
検証済み
カテゴリ
PECVD
最終検証： 20日前
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
Deinstalled
製品ID：
113545
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
25K PECVD
カテゴリ
PECVD
最終検証： 20日前
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
Deinstalled
製品ID：
113545
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
APPLIED MATERIALS AMAT AKT 25 K GEN 6 PECVD CHAMBER ONLY構成
Chambers were never commisioned and remain in “new” unused condition. Sold “AS IS” Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: ASTRON HF+, AX7636-04OEMモデルの説明
AKT-25K PECVD(1,500mm x 1,850mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafersドキュメント
ドキュメントなし