説明
HDD included構成
3CHOEMモデルの説明
The Applied Producer Celera PECVD system offers industry-standard tunable compressive and tensile high-stress silicon nitride films for strain engineering applications at advanced nodes. The system offers an integrated stress nitride deposition and UV cure that delivers tensile stress of up to 1.7GPa, while meeting low thermal budget requirements. The same chamber can deposit films with compressive stresses up to 3.5 GPa with extended RF capability. The process utilizes production-proven silane CVD technology to deliver superior step coverage (70%) and high-quality film with low hydrogen content while retaining excellent SiN etch-stop properties and pattern-loading results. The Applied Celera deposition and UV cure processes are integrated on the production-proven, high-throughput Producer platform with its flexible Twin Chamber® configuration and platform extendibility that enables customers to leverage the Producer toolset for multiple process nodes.ドキュメント
ドキュメントなし
カテゴリ
PECVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
127115
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
PRODUCER GT CELERA
カテゴリ
PECVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
127115
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
HDD included構成
3CHOEMモデルの説明
The Applied Producer Celera PECVD system offers industry-standard tunable compressive and tensile high-stress silicon nitride films for strain engineering applications at advanced nodes. The system offers an integrated stress nitride deposition and UV cure that delivers tensile stress of up to 1.7GPa, while meeting low thermal budget requirements. The same chamber can deposit films with compressive stresses up to 3.5 GPa with extended RF capability. The process utilizes production-proven silane CVD technology to deliver superior step coverage (70%) and high-quality film with low hydrogen content while retaining excellent SiN etch-stop properties and pattern-loading results. The Applied Celera deposition and UV cure processes are integrated on the production-proven, high-throughput Producer platform with its flexible Twin Chamber® configuration and platform extendibility that enables customers to leverage the Producer toolset for multiple process nodes.ドキュメント
ドキュメントなし