説明
Oxford Plasmalab 100 ICP 180 RIE System 208V, 50/60Hz, w/ VAT PM-5 adaptive pressure controller, Adixen ACT 1300M turbopump controller. Thermo Neslab chiller, BOM#274103200000; Leybold D65BC vacuum pump w/ oil filter & exhaust filter; Anest Iwata Scroll Meister vacuum pump; OptiTemp OTI-5WL-P3-216 chiller; gas box; control computer LCD monitor; computer cart. 64in x 29in x 49in H.構成
構成なしOEMモデルの説明
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small piecesドキュメント
ドキュメントなし
カテゴリ
PECVD
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
135814
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
OXFORD
PLASMALAB 100
カテゴリ
PECVD
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
135814
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Oxford Plasmalab 100 ICP 180 RIE System 208V, 50/60Hz, w/ VAT PM-5 adaptive pressure controller, Adixen ACT 1300M turbopump controller. Thermo Neslab chiller, BOM#274103200000; Leybold D65BC vacuum pump w/ oil filter & exhaust filter; Anest Iwata Scroll Meister vacuum pump; OptiTemp OTI-5WL-P3-216 chiller; gas box; control computer LCD monitor; computer cart. 64in x 29in x 49in H.構成
構成なしOEMモデルの説明
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small piecesドキュメント
ドキュメントなし