説明
Plasmalab 800 Plus PECVD構成
Gas type : N2O , N2 , SiH4 , CF4/O2 Software version: PC2000 V1.8OEMモデルの説明
The PlasmaPro 800Plus is a plasma etch and deposition solution that offers a large area for processing. It features an open loading design, making it easy to use and convenient to site, all while maintaining a compact footprint. The system is capable of handling full 300mm wafers or large batches of 43 x 50mm (2”) wafers, thanks to its 380mm or 460mm diameter table. This makes the PlasmaPro 800Plus a well-proven market-leading product that offers full production solutions without compromising on process quality.ドキュメント
ドキュメントなし
カテゴリ
PECVD
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
134610
ウェーハサイズ：
不明
ヴィンテージ：
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
OXFORD
PLASMALAB 800 PLUS
カテゴリ
PECVD
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
134610
ウェーハサイズ：
不明
ヴィンテージ：
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Plasmalab 800 Plus PECVD構成
Gas type : N2O , N2 , SiH4 , CF4/O2 Software version: PC2000 V1.8OEMモデルの説明
The PlasmaPro 800Plus is a plasma etch and deposition solution that offers a large area for processing. It features an open loading design, making it easy to use and convenient to site, all while maintaining a compact footprint. The system is capable of handling full 300mm wafers or large batches of 43 x 50mm (2”) wafers, thanks to its 380mm or 460mm diameter table. This makes the PlasmaPro 800Plus a well-proven market-leading product that offers full production solutions without compromising on process quality.ドキュメント
ドキュメントなし