説明
Etchers構成
構成なしOEMモデルの説明
The CC-400 is a load-lock-type plasma CVD system that is part of the CC-Series (CC-200/400). It is a compact and easy-to-use system designed for both R&D and production. The system supports high-density plasma processes on 27.12MHz and can deposit SiH4 (SiO2, SiNx, SiON, a-Si) and TEOS (SiO2). It also supports chamber cleaning by CF4+O2 plasma, heater for low-temperature deposition of organic EL, and various substrate sizes. The CC-400 has special features and further applications in compound-related devices of LED, LD, high-speed devices, organic EL systems for R&D use, solar battery systems for R&D use, and MEMS.ドキュメント
ドキュメントなし
ULVAC
CC-400
検証済み
カテゴリ
PECVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
101271
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2023
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULVAC
CC-400
カテゴリ
PECVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
101271
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2023
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Etchers構成
構成なしOEMモデルの説明
The CC-400 is a load-lock-type plasma CVD system that is part of the CC-Series (CC-200/400). It is a compact and easy-to-use system designed for both R&D and production. The system supports high-density plasma processes on 27.12MHz and can deposit SiH4 (SiO2, SiNx, SiON, a-Si) and TEOS (SiO2). It also supports chamber cleaning by CF4+O2 plasma, heater for low-temperature deposition of organic EL, and various substrate sizes. The CC-400 has special features and further applications in compound-related devices of LED, LD, high-speed devices, organic EL systems for R&D use, solar battery systems for R&D use, and MEMS.ドキュメント
ドキュメントなし