NES2W-i10
カテゴリ
Photolithography概要(Overview)
NES2W-i10 systems are 1x steppers that utilize a newly developed projection lens with a 0.07 numerical aperture to deliver depth of focus up to 74 µm and beyond. In addition, their advanced autofocus systems provide die-by-die autofocus capabilities that further increase yield for these difficult processes, providing a superior alternative to mask aligners that have historically been used.
現在の掲載品
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検査、保証、鑑定、ロジスティクス