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6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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NIKON NES2W-i10
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    NES2W-i10 systems are 1x steppers that utilize a newly developed projection lens with a 0.07 numerical aperture to deliver depth of focus up to 74 µm and beyond. In addition, their advanced autofocus systems provide die-by-die autofocus capabilities that further increase yield for these difficult processes, providing a superior alternative to mask aligners that have historically been used.
    ドキュメント

    ドキュメントなし

    NIKON

    NES2W-i10

    verified-listing-icon

    検証済み

    カテゴリ
    Photolithography

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    106537


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    NIKON NES2W-i10

    NIKON

    NES2W-i10

    Photolithography
    ヴィンテージ: 0状態: 改修済み
    最終確認60日以上前

    NIKON

    NES2W-i10

    verified-listing-icon
    検証済み
    カテゴリ
    Photolithography
    最終検証: 60日以上前
    listing-photo-57605b11e78e4524b539a770be696f27-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    106537


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    NES2W-i10 systems are 1x steppers that utilize a newly developed projection lens with a 0.07 numerical aperture to deliver depth of focus up to 74 µm and beyond. In addition, their advanced autofocus systems provide die-by-die autofocus capabilities that further increase yield for these difficult processes, providing a superior alternative to mask aligners that have historically been used.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    NIKON NES2W-i10

    NIKON

    NES2W-i10

    Photolithographyヴィンテージ: 0状態: 改修済み最終検証:60日以上前